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Hard X-ray photoelectron spectroscopy on buried, off-stoichiometric CoxMnyGez (x : z = 2 : 0.38) Heusler thin films

机译:埋藏,非化学计量的硬X射线光电子能谱   CoxmnyGez(x:z = 2:0.38)赫斯勒薄膜

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摘要

Fully epitaxial magnetic tunnel junctions (MTJs) with off-stoichiometricCo2-based Heusler alloy shows a intense dependency of the tunnelmagnetoresistance (TMR) on the Mn composition, demonstrating giant TMR ratiosof up to 1995% at 4.2 K for 1. This work reports on the electronic structure ofnon-stoichiometric CoxMnyGez thin films with a fixed Co/Ge ratio of x : z = 2 :0.38. The electronic structure was investigated by high energy, hard X-rayphotoelectron spectroscopy combined with first-principles calculations. Thehigh-resolution measurements of the valence band of the non-stoichiometricCoxMnyGez films close to the Fermi energy indicate a shift of the spectralweight compared to bulk Co2MnGe. This is in agreement with the changes in thedensity of states predicted by the calculations. Furthermore it is shown thatthe co-sputtering of Co2MnGe together with additional Mn is an appropriatetechnique to adjust the stoichiometry of the CoxMnyGez film composition. Theresulting changes of the electronic structure within the valence band willallow to tune the magnetoresistive characteristics of CoxMnyGez based tunneljunctions as verified by the calculations and photoemission experiments.
机译:具有非化学计量比的基于Co2的Heusler合金的完全外延磁性隧道结(MTJ)显示出隧道磁阻(TMR)对Mn成分的强烈依赖性,证明在4.2 K时1的巨TMR比率高达1995%。 Co / Ge比固定为x:z = 2:0.38的非化学计量CoxMnyGez薄膜的电子结构。通过高能硬X射线光电子能谱结合第一性原理计算研究了电子结构。非化学计量的CoxMnyGez薄膜的价带接近费米能量的高分辨率测量表明,与块状Co2MnGe相比,光谱权重发生了变化。这与通过计算预测的状态的密度变化一致。此外,表明Co 2 MnGe与另外的Mn的共同溅射是调节CoxMnyGez膜组成的化学计量的合适技术。计算结果和光发射实验证明,价带内电子结构的变化将允许调整基于CoxMnyGez的隧道结的磁阻特性。

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